Creating AlN substrates that will enable next-generation devices

Technology

Advantages of our substrate materials:

  • High production rate
  • Scalable
  • Low defectivity (templates <10^7^, bulk <10^4^ defects/cm^2^)
  • High UV transparency

Advantages of our coatings materials:

  • High density
  • Ability to coat directly on copper, aluminum, silicon substrates
  • Thermal conductivity substantially higher than ceramic aluminum nitride
  • High voltage breakdown values

Next Event

11th International Conference on Nitride Semiconductors

August 30, 2015 – September 4, 2015

Nitride Solutions // 3333 West Pawnee, Wichita, KS 67213 // info@nitridesolutions.com // Copyright © 2015